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2-12inch Silicon Thermal Oxidation Wafer

Dry Oxidation Silicon Wafer
Wet Oxidation Silicon Wafer
Si Thermal OxidationWafer

2-12inch Silicon Thermal Oxidation Wafer

Silicon oxide wafer is thermal growth a uniform oxide layer on the bare silicon wafer surface .The oxidation process includes high-temperature dry oxidation and high-temperature wet oxidation.

  • Item No :

    004

  • Order(MOQ) :

    1

  • Payment :

    100% prepay

  • Product Origin :

    China
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Silicon Thermal Oxidation Wafer

Diameter 2inch,3inch 4inch,5inch 6inch 8inch  12inch
Orientation  (100),(111) (100),(111) (100),(111) (100),(111) (100),(111)
Type N,P,Intrinsic N,P,Intrinsic N,P,Intrinsic N,P,Intrinsic P,Intrinsic
Dopant Phos,Boron,As,Sb,Undopant Phos,Boron,As,Sb,Undopant Phos,Boron,As,Sb,Undopant Phos,Boron,Undopant Boron
Resistivity （Ohm.cm) ＜0.1，＜0.01,1-10,1-100，＞1000，＞10000，＞20000
any other as your request		 ＜0.1，＜0.01,1-10,1-100，＞1000，＞10000，＞20000
any other as your request		 ＜0.1，＜0.01,1-10,1-100，＞1000，＞10000，＞20000
any other as your request		 ＜0.1，＜0.01,1-10,1-100，＞1000，＞10000，＞20000
any other as your request		 ＜1, 1-100，＞10000，
any other as your request
Sio2 on Surface double side with Sio2 layer double side with Sio2 layer double side with Sio2 layer double side with Sio2 layer double side with Sio2 layer
The thickness of Sio2 layer 100nm,200nm,300nm,500nm,1um
 any other thickness as your request		 100nm,200nm,300nm,500nm,1um
 any other thickness as your request		 100nm,200nm,300nm,500nm,1um
 any other thickness as your request		 100nm,200nm,300nm,500nm,1um
 any other thickness as your request		 100nm,200nm,300nm,500nm,1um
 any other thickness as your request
 

 

Application:

1. Integrated Circuit: Thermal oxide silicon wafers are one of the commonly used semiconductor materials in integrated circuit manufacturing, and are widely used in the manufacturing of chips such as microprocessors and memories.

2. Solar cells: Thermal oxide silicon wafers can be used to manufacture efficient and stable solar cells, and are one of the commonly used materials in the solar energy field

FAQ:

1:What's the minimum order quantity ?

We have stock so please inform the quantity you need and then we will check the quantity of our stock .If we don't have stock will base on our material we have .

2:What's the production time?

If we have stock the lead time around 2-3week .If need make production the lead time need discuss base on your quantity .

3:What is your payment method ？

Usualy by TT if you need other method pls discuss with us .

 

Hot Tags : Silicon Thermal Oxidation Wafer 300mm TOX Silicon Wafer Wet Thermal Oxidation Silicon Wafer Dry Thermal Oxidation Silicon Wafer Silicon With SiO2 Layer Silicon With SiO2 Film
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